Deposition Chamber for Thin Film Deposition

dc.contributor.author Flemington, Kyle
dc.date.accessioned 2015-06-09T18:50:15Z
dc.date.available 2015-06-09T18:50:15Z
dc.date.issued 2015-06-09
dc.description.abstract The study of thin films has been pertinent in the semiconductor industry for some years now. Research is being done in order to attain a greater understanding of the physical characteristics of thin films. In order to evaporate the metal of interest, a physical vapor deposition process is used. A sample metal is vaporized using an electron beam, the metal then condenses on a substrate with a diameter of 4 inches forming a thin film. This chamber has the capability to make gradient films to study the effect thickness has on texture transformations using physical vapor deposition. It also includes an evaporation rate monitor with a similar design to an ion gauge. In order to ensure deposition onto clean substrates, a Commonwealth Scientific Company Mark I ion mill will be used to clean before deposition.
dc.identifier.uri https://dspace.houghton.edu/handle/hc/3770
dc.publisher Houghton College
dc.rights Authors retain the copyright for all content posted in this repository. This material may not be published, reproduced, broadcast, rewritten, or redistributed beyond the Houghton College community without permission except in accordance with fair use doctrine.
dc.subject Student Projects
dc.title Deposition Chamber for Thin Film Deposition
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