Design and Construction of a Deposition Chamber for Thin Metal Films Research
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Date
2008-04-05
Authors
Aikens, Kurt
Hoffman, Brandon
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Houghton College
Abstract
A high vacuum deposition chamber is being built at Houghton College for studies of thin metal films. Metal atoms evaporated via an electron beam will contact a silicon wafer at near normal incidence, growing a uniform thin film. An ion mill will be constructed for cleaning the silicon wafers and for ion beam assisted deposition (IBAD). A computer-controlled shield will enable deposition of samples of varying thickness.
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Event
XXVII Annual Rochester Symposium for Physics Students, University of Rochester, Rochester, NY., April 5, 2008.
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