Design and Construction of a Deposition Chamber for Thin Metal Films Research

Thumbnail Image
Date
2008-04-05
Authors
Aikens, Kurt
Hoffman, Brandon
Journal Title
Journal ISSN
Volume Title
Publisher
Houghton College
Abstract
A high vacuum deposition chamber is being built at Houghton College for studies of thin metal films. Metal atoms evaporated via an electron beam will contact a silicon wafer at near normal incidence, growing a uniform thin film. An ion mill will be constructed for cleaning the silicon wafers and for ion beam assisted deposition (IBAD). A computer-controlled shield will enable deposition of samples of varying thickness.
Description
Event
XXVII Annual Rochester Symposium for Physics Students, University of Rochester, Rochester, NY., April 5, 2008.
Keywords
Student Projects
Collections
Rights
Authors retain the copyright for all content posted in this repository. This material may not be published, reproduced, broadcast, rewritten, or redistributed beyond the Houghton College community without permission except in accordance with fair use doctrine.