Design and Construction of a Deposition Chamber for Thin Metal Films Research

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dc.contributor.authorAikens, Kurt
dc.contributor.authorHoffman, Brandon
dc.date.accessioned2008-04-05T18:50:15Z
dc.date.available2008-04-05T18:50:15Z
dc.date.issued2008-04-05
dc.description.abstractA high vacuum deposition chamber is being built at Houghton College for studies of thin metal films. Metal atoms evaporated via an electron beam will contact a silicon wafer at near normal incidence, growing a uniform thin film. An ion mill will be constructed for cleaning the silicon wafers and for ion beam assisted deposition (IBAD). A computer-controlled shield will enable deposition of samples of varying thickness.
dc.description.statementofresponsibilityXXVII Annual Rochester Symposium for Physics Students, University of Rochester, Rochester, NY., April 5, 2008.
dc.identifier.urihttps://dspace.houghton.edu/handle/hc/3638
dc.publisherHoughton College
dc.rightsAuthors retain the copyright for all content posted in this repository. This material may not be published, reproduced, broadcast, rewritten, or redistributed beyond the Houghton College community without permission except in accordance with fair use doctrine.
dc.subjectStudent Projects
dc.titleDesign and Construction of a Deposition Chamber for Thin Metal Films Research
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