Effects of Deposition Temperature on Stacking Fault Density, Texture Transformation in Thin Silver Films

dc.contributor.author Olandt, Sarah
dc.contributor.author Zhuravlev, Daniil
dc.contributor.author Hoffman, Brandon
dc.contributor.author Rogers, Nate
dc.contributor.author Baker, Shefford
dc.date.accessioned 2019-03-30T18:50:15Z
dc.date.available 2019-03-30T18:50:15Z
dc.date.issued 2019-03-30
dc.description.abstract X-Ray Diffraction analysis was used to measure stacking fault density and texture transformation in silver films created with electron-beam evaporation techniques. Films were heated during the deposition process to obtain samples with different deposition temperatures. Samples were analyzed using X-Ray Diffraction for texture and fault density in as-deposited states and after intervals of annealing. Analysis of scans reveals fewer faults and less (111) to (100) texture transformation in films deposited at higher
dc.description.statementofresponsibility XXXVIII Annual Rochester Symposium for Physics Students, University of Rochester, March 30, 2019.
dc.identifier.uri https://dspace.houghton.edu/handle/hc/3636
dc.publisher Houghton College
dc.rights Authors retain the copyright for all content posted in this repository. This material may not be published, reproduced, broadcast, rewritten, or redistributed beyond the Houghton College community without permission except in accordance with fair use doctrine.
dc.subject Student Projects
dc.title Effects of Deposition Temperature on Stacking Fault Density, Texture Transformation in Thin Silver Films
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
2019_Sarah-Olandt_et-al._poster.pdf
Size:
1.08 MB
Format:
Adobe Portable Document Format
Description:
Collections